Xia Elected Fellow of American Physical Society

Fengnian Xia, the Barton L. Weller Professor of Electrical Engineering, has been elected a 2023 Fellow of the American Physical Society (APS).

The APS Fellowship Program was created to recognize members who may have made advances in physics through original research and publication, or made significant innovative contributions in the application of physics to science and technology. They may also have made significant contributions to the teaching of physics or service and participation in the activities of the Society.

The number of APS Fellows elected each year is limited to no more than one half of one percent of the membership. The Fellows are chosen by peers in their research areas for outstanding contributions to physics.

Xia was cited for "foundational contributions to the study of optical properties of two-dimensional materials and their applications to optoelectronics and nanophotonics and contributions to the developments of silicon photonic integrated circuits."

His research group focuses on light-matter interaction and photonic devices; carrier transport and electronic devices; device applications in imaging, communications, and electronics; and integration of emerging and traditional materials. Xia's team has become one of the first to initiate black phosphorus research and propose the possible roles of thin-film phosphorus in future photonics and electronics.

A graduate of Tsinghua University, Xia earned his M.A. and Ph.D. from Princeton University. Prior to joining the Yale faculty in 2013, he held research and engineering positions at the IBM Thomas J. Watson Research Center in Yorktown Heights, New York.

The APS is a nonprofit membership organization with more than 53,000 members that promotes physics through its research journals, meetings, and education, outreach, advocacy, and international activities.